Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactor

Wu, J. J.J. J.WuChen, K. H.K. H.ChenWen, C. Y.C. Y.WenChen, L. C.L. C.ChenGuo, X. J.X. J.GuoLo, H. J.H. J.LoLin, S. T.S. T.LinYu, Y. C.Y. C.YuWang, C. W.C. W.WangCHENG-YEN WENLI-CHYONG CHEN2020-01-062020-01-0620000925-9635https://scholars.lib.ntu.edu.tw/handle/123456789/445767Effect of carbon sources on silicon carbon nitride films growth in an electron cyclotron resonance plasma chemical vapor deposition reactorjournal article10.1016/S0925-9635(99)00218-6WOS:000087382400065