Lu Y.-C.Hsueh C.-H.CHUN-HWAY HSUEH2019-09-252019-09-2520189784863486942https://scholars.lib.ntu.edu.tw/handle/123456789/424963Nanosphere lithography (NSL) method for fabricating the large-scale periodic nanostructure has been widely reported for plasmonics applications [1]. Compared to e-beam lithography, NSL is an inexpensive, reproducible and facile method to produce an order pattern with a large area. However, the drawback of NSL is that predisposition to defect formation limits perfect periodicity down to micrometer-sized area. Thus possible use of NSL for the fabrication of defect-free structures in large domains represents a challenge. ? 2018 OSA - The Optical Society. All rights reserved.conference paper2-s2.0-85065867067https://www2.scopus.com/inward/record.uri?eid=2-s2.0-85065867067&partnerID=40&md5=8b84f3fbfb2f86ce1e3c3a1a6d3f11dc