The effect of photon illumination in rapid thermal processing on the characteristics of MOS structures with ultra-thin oxides examined by substrate injection

JENN-GWO HWU2018-09-102018-09-102005http://www.scopus.com/inward/record.url?eid=2-s2.0-27744567378&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/314471The effect of photon illumination in rapid thermal processing on the characteristics of MOS structures with ultra-thin oxides examined by substrate injectionjournal article10.1016/j.sse.2005.06.024