Bhusari D.M.Chen K.H.Yang J.R.Lin S.T.Wang T.Y.Chen L.C.LI-CHYONG CHEN2022-08-092022-08-09199802729172https://www.scopus.com/inward/record.uri?eid=2-s2.0-0031629980&partnerID=40&md5=d846c54c121520042b05a302b6775b96https://scholars.lib.ntu.edu.tw/handle/123456789/616455We report here growth of highly transparent nano-crystalline diamond films on quartz substrates by microwave plasma enhanced CVD. Optical transmittance of greater than 84% beyond 700 nm has been obtained for films as thick as 1 μm. Such high optical transparency of these films is primarily attributed to the high smoothness of their surface (average roughness of about 60-65 angstroms) as well as the high content of sp3 bonded carbon therein. The effects of methane fraction in the source gas, substrate temperature and grain size of the diamond powder used for substrate protreatment on the structural and optical properties of these films are also studied.Chemical vapor deposition;Crystal growth;Crystal structure;Film growth;Grain size and shape;Light transmission;Microwaves;Nanostructured materials;Plasma applications;Quartz;Surface roughness;Transparency;Microwave plasma enhanced chemical vapor deposition;Diamond filmsGrowth of highly transparent nano-crystalline diamond films by microwave CVDconference paper2-s2.0-0031629980