Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variability

Hoi-Tou NgChun-Hung LiuHsing-Hong ChenKuen-Yu TsaiKUEN-YU TSAI2018-09-102018-09-102009-02http://scholars.lib.ntu.edu.tw/handle/123456789/352121Selection of Gaussian-beam and raster-scan parameters in electron-beam direct-write lithography considering device patterning and performance variabilityconference paper