Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithography

C.H. LinL.A. WangLON A. WANG2018-09-102018-09-102001-11http://scholars.lib.ntu.edu.tw/handle/123456789/294531Feasibility of utilizing hexamethyldisiloxane film as a bottom antireflective coating for 157 nm lithographyjournal article10.1116/1.14175492-s2.0-0035519153WOS:000173159900059