Formation of cylindrical profile of Si by KrF excimer laser system for optical interconnect

Hung, S.-C.S.-C.HungShiu, S.-C.S.-C.ShiuChao, J.-J.J.-J.ChaoCHING-FUH LIN2018-09-102018-09-102011http://www.scopus.com/inward/record.url?eid=2-s2.0-84858968032&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/364951Formation of cylindrical profile of Si by KrF excimer laser system for optical interconnectconference paper10.1109/NANO.2011.6144570