胡振國Wu, Y. L.Y. L.WuHwu, Jenn-GwoJenn-GwoHwu2009-04-272018-07-062009-04-272018-07-061993http://ntur.lib.ntu.edu.tw//handle/246246/153910en-USImproved Gate Oxide Reliability by Repeated N20 Rapid Thermal Annealingsreport