Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealing

Shih H.-Y.Lee W.-H.Kao W.-C.Chuang Y.-C.Lin R.-M.Lin H.-C.Shiojiri M.HSIN-CHIH LINMIIN-JANG CHEN2019-11-272019-11-27201720452322https://www.scopus.com/inward/record.uri?eid=2-s2.0-85007545369&doi=10.1038%2fsrep39717&partnerID=40&md5=771bf2c92837503da94bfc8df0a098edhttps://scholars.lib.ntu.edu.tw/handle/123456789/432412Low-temperature atomic layer epitaxy of AlN ultrathin films by layer-by-layer, in-situ atomic layer annealingjournal article10.1038/srep397172-s2.0-85007545369