Fast nano-scale texturing using the self-assembly polymer mask and wet chemical etching

Lin, C.-H.C.-H.LinDu, C.-H.C.-H.DuLan, C.-W.C.-W.LanCHUNG-WEN LAN2020-01-062020-01-062009https://scholars.lib.ntu.edu.tw/handle/123456789/444892Fast nano-scale texturing using the self-assembly polymer mask and wet chemical etchingconference paper10.1109/PVSC.2009.54117802-s2.0-77951557970https://www.scopus.com/inward/record.uri?eid=2-s2.0-77951557970&doi=10.1109%2fPVSC.2009.5411780&partnerID=40&md5=e0552390ea78fdbf1f32bfde658fed97