High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimes

Chen, H.L.H.L.ChenCheng, H.C.H.C.ChengKo, T.S.T.S.KoKo, F.H.F.H.KoChu, T.C.T.C.ChuHSUEN-LI CHEN2020-05-122020-05-122004https://scholars.lib.ntu.edu.tw/handle/123456789/491354High reflectance of reflective-type attenuated-phase-shifting masks for extreme ultraviolet lithography with high inspection contrast in deep ultraviolet regimesconference paper10.1116/1.18134502-s2.0-13244255813https://www.scopus.com/inward/record.uri?eid=2-s2.0-13244255813&doi=10.1116%2f1.1813450&partnerID=40&md5=62646efb8544841005c5bc18c7b4b17e