A comprehensive model for sub-10nm electron-beam patterning through the shorttime and cold development

Li-Cheng ChangChun NienJia-Hao YeCheng-Huan ChungVin-Cent SuChao-Hsin WuChieh-Hsiung KuanCHAO-HSIN WU2019-10-312019-10-312017https://scholars.lib.ntu.edu.tw/handle/123456789/429857A comprehensive model for sub-10nm electron-beam patterning through the shorttime and cold developmentjournal article10.1088/1361-6528/aa8005