Effect of surface Si redistribution on the alignment of Ge dots grown on pit-patterned Si(001) substrates

CHIEH-HSIUNG KUANSAO-JIE CHENChen, H.-M.H.-M.ChenSuen, Y.-W.Y.-W.SuenChen, S.-J.S.-J.ChenLuo, G.-L.G.-L.LuoLai, Y.-P.Y.-P.LaiChen, S.-T.S.-T.ChenLee, C.-H.C.-H.LeeCHIEH-HSIUNG KUANSAO-JIE CHEN2018-09-102018-09-102014http://www.scopus.com/inward/record.url?eid=2-s2.0-84909946973&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/387108[SDGs]SDG15Effect of surface Si redistribution on the alignment of Ge dots grown on pit-patterned Si(001) substratesjournal article10.1088/0957-4484/25/47/475301