范光照Fan, Kuang-Chao臺灣大學:機械工程學研究所李佰堃Li, Bai-KunBai-KunLi2010-06-302018-06-282010-06-302018-06-282007U0001-3012200714081300http://ntur.lib.ntu.edu.tw//handle/246246/187022隨著微/奈米技術的發展，許多微/奈米加工與量測系統的開發都有賴於奈米位移量測或定位技術；然而，一般具有奈米解析度的感測器，其價格昂貴且容易受到環境的影響，於是發展一個微小化、低成本、高解析、不易受環境影響之感測器即是量測科技中一個重要的課題。文提出一種具高對位公差之簡易型微小化雷射繞射式光學尺，係為一光柵干涉儀，其原理是利用都卜勒效應，將量測之基準由雷射波長轉換為光柵節距，使環境所造成之量測誤差減小，透過光柵尺將光干涉訊號轉換成電壓訊號，最後經過解碼得知實際位移資訊。學架構上，本光學尺設計特殊的光路，將光學架構簡易化與微小化，達到降低成本、減小環境影響以及簡化光學系統在組裝上複雜的流程。另一方面，在光學分析軟體的模擬下，也印證了此光路架構能夠有效地提高光柵與光學頭間的對位公差。號處理上，本文也同時開發出一套訊號修正方法。以類比電路、電腦與NI DAQ卡配合Labview人機介面以達成訊號之直流飄移以及振幅變動修正，可有效修正因光柵之偏擺造成的不完美訊號。此外，以Labview軟體建立訊號的分向計數與細分割程式，完成位移量測。SIOS MI5000雷射干涉儀校驗後，在一密閉腔體而無任何溫度、溼度、震動補償的實驗室環境條件下，本光學尺系統在全行程15mm量測範圍內，量測準確性在20nm以下，量測重複性在14nm以下。For the development of micro/nano technology, many nano manufacturing and measuring systems depend on the metrology or positioning in the nanometer displacement scale. However, Sensors with long measuring distance and high resolution are expensive and easily affected by the unstable environment. Thus, to development the sensors have compact, low cost, high resolution, and low environment effect is becoming more indispensable. newly simple configuration and compact laser diffraction encoder system with high alignment tolerance was developed in this thesis. It is one type of the grating interferometer which principle used by Doppler Effect, taking the grating pitch instead of laser wavelength, it can reduce errors caused by the unstable environment. Through moving grating, the interference signals are converted into voltage signals, and finally be encoded to the displacement information. n the optical frame, the optical encoder adopts a special design in optical path that simplify the optical configuration and minify structure size. The environmental disturbance and complicated assemble procedure in optical system can be reduced effectively. On the other hand, the feasibility of high alignment tolerance between the optical head and the grating is achieved by the simulation of optics analysis software.n the signal processing frame, A signal correcting procedure is also developed in this thesis. The signal correction of DC drift and amplitude variation can be reached by combing analogical circuit, personal computer, NI DAQ and Labview software interface. The Errors in quadrature signals caused by the oscillating of the grating can be corrected effectively. In addition, the displacement measurement were accomplished with count and interpolation program by Labview software.o verify the theoretical predictions and the overall system specifications of the system, the SIOS MI5000 laser interferometer was adopted as the calibration tool. Within the measuring distance of 15mm, running the test at closed chamber with no temperature, humidity, vibrating calibration in regular laboratory environment, the measurement accuracy is below 20nm and the measurement repeatability is below 14 nm.摘要 Ibstract II錄 III目錄 V目錄 IXㄧ章 緒論 1-1研究動機與目的 1-2參考文獻回顧 1-3研究方法與內容概要 7二章 光柵干涉儀的量測原理 8-1 前言 8-2 光柵繞射原理 8-3 都卜勒效應 9-3-1 波源移動的都卜勒效應 9-3-2 雙重都卜勒效應 9-3-3 移動繞射光柵的都卜勒頻移效應 10-4 量測原理 11-4-1 干涉原理 11-4-2 光干涉之行為與成立條件 13-4-3 差頻干涉 17-4-4 光柵干涉儀的位移轉換原理 17三章 光學頭系統設計 19-1 光路設計原理 19-1-1 設計概念 19-1-2 偏極光學理論–瓊司向量及瓊司矩陣 20-2 光路架構 22-2-1 光路系統簡述 22-2-2 光路理論推導 24-2-3 光干涉對比度討論 27-3 光學系統安裝機構設計 29四章 公差分析 30-1 前言 30-2 光學頭與光柵對位公差分析 30-3 光學頭元件定位公差分析 37-3-1 元件位置公差 37-3-2 元件角度公差 39-3-3 Q1、Q2快軸角度對量測訊號的影響 41-3-4 Q3快軸角度對量測訊號的影響 41五章 訊號解析 43-1 前言 43-2 電路設計 43-2-1 訊號處理電路設計 43-2-2 訊號修正電路設計 45-4 訊號之計數及細分割 47-4-1 分向法及計數程式 47-4-2 細分割程式 48-4-3 量測程式設計及規劃 49六章 實驗結果 52-1 前言 52-2 光學尺元件調校及組裝步驟 52-3 訊號測試 57-4 光學尺系統之量測重複性實驗 60-5 誤差來源分析 65七章 結論與未來展望 66-1 結論 66-2 未來展望 67考文獻 68錄A 相關設備元件規格 704844250 bytesapplication/pdfen-US雷射光學尺光柵干涉繞射細分Laser optical encoderGratingInterferenceDiffractionInterpolationthesishttp://ntur.lib.ntu.edu.tw/bitstream/246246/187022/1/ntu-96-R94522732-1.pdf