Plasma power controlled deposition of SiO<inf>x</inf> with manipulated Si quantum dot size for photoluminescent wavelength tailoring

Lai, B.-H.B.-H.LaiCheng, C.-H.C.-H.ChengPai, Y.-H.Y.-H.PaiGONG-RU LIN2020-06-112020-06-112010https://scholars.lib.ntu.edu.tw/handle/123456789/500130[SDGs]SDG7Plasma power controlled deposition of SiO<inf>x</inf> with manipulated Si quantum dot size for photoluminescent wavelength tailoringjournal article10.1364/OE.18.0044492-s2.0-77749304266https://www.scopus.com/inward/record.uri?eid=2-s2.0-77749304266&doi=10.1364%2fOE.18.004449&partnerID=40&md5=a770992911e571994752df1ce9c947e1