Dual layer photoresist complimentary lithography applied on sapphire substrate for producing submicron patterns

Chang, C.-M.C.-M.ChangChiang, D.D.ChiangShiao, M.-H.M.-H.ShiaoYang, C.-T.C.-T.YangHuang, M.-J.M.-J.HuangCheng, C.-T.C.-T.ChengWEN-JENG HSUEH2020-01-172020-01-172013https://scholars.lib.ntu.edu.tw/handle/123456789/451905Dual layer photoresist complimentary lithography applied on sapphire substrate for producing submicron patternsconference paper10.1007/s00542-013-1881-12-s2.0-84887235947https://www.scopus.com/inward/record.uri?eid=2-s2.0-84887235947&doi=10.1007%2fs00542-013-1881-1&partnerID=40&md5=d1dc47204f251dcdf69f979cf2dbc5b4