Characteristics of ALD high-�e HfAlO<inf>x</inf> nanocrystals in memory capacitors annealed at high temperatures

Li, W.C.W.C.LiBanerjee, W.W.BanerjeeMaikap, S.S.MaikapYang, J.R.J.R.YangJER-REN YANG2020-05-122020-05-122010https://scholars.lib.ntu.edu.tw/handle/123456789/491591Characteristics of ALD high-�e HfAlO<inf>x</inf> nanocrystals in memory capacitors annealed at high temperaturesconference paper10.1149/1.34816232-s2.0-79952658982https://www.scopus.com/inward/record.uri?eid=2-s2.0-79952658982&doi=10.1149%2f1.3481623&partnerID=40&md5=e51693a29ff69444ec7797e53a9a375c