Characteristics of plasma enhanced chemical vapor deposition-grown SiN[sub x] films prepared for deep ultraviolet attenuated phase-shifting masks

Chen, H. L.H. L.ChenL. A. WangLON A. WANGHSUEN-LI CHEN2020-05-122020-05-1219980734211Xhttps://scholars.lib.ntu.edu.tw/handle/123456789/491409Characteristics of plasma enhanced chemical vapor deposition-grown SiN[sub x] films prepared for deep ultraviolet attenuated phase-shifting masksjournal article10.1116/1.590314http://scitation.aip.org/content/avs/journal/jvstb/16/6/10.1116/1.590314