Wu, T. B.T. B.WuLan, K. Y.K. Y.LanChiang, C. D.C. D.ChiangGong, J.J.Gong楊聲震Yang, Seng-JennSeng-JennYang2009-02-042018-07-062009-02-042018-07-061988http://ntur.lib.ntu.edu.tw//handle/246246/120421en-USActivation of Boron Implanted in Hg0.7Cd0.3Te by High-Temperature Annealingjournal article