The kinetics of a negative-tone acrylic photoresist for 193-nm lithography

Fu, S. C.S. C.FuHsieh, K. H.K. H.Hsieh2011-11-112018-07-052011-11-112018-07-052000http://ntur.lib.ntu.edu.tw//handle/246246/237774en-USThe kinetics of a negative-tone acrylic photoresist for 193-nm lithographyjournal article10.1002/(SICI)1099-0518(20000315)38:6<954::AID-POLA4>3.3.CO;2-Ohttp://ntur.lib.ntu.edu.tw/bitstream/246246/237774/-1/02.pdfhttp://ntur.lib.ntu.edu.tw/bitstream/246246/237774/-1/index.html