In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectrics

Tsai M.-C.Lee M.-H.Kuo C.-L.HSIN-CHIH LINMIIN-JANG CHEN2019-11-272019-11-27201601694332https://www.scopus.com/inward/record.uri?eid=2-s2.0-84976468119&doi=10.1016%2fj.apsusc.2016.06.071&partnerID=40&md5=b64579920d3fba023edf67e9e96ec583https://scholars.lib.ntu.edu.tw/handle/123456789/432415[SDGs]SDG6In situ atomic layer nitridation on the top and down regions of the amorphous and crystalline high-K gate dielectricsjournal article10.1016/j.apsusc.2016.06.0712-s2.0-84976468119