In-situ micro strain gauges for measuring residual strain of three cmos thin films using only one maskless post-processing step

Dai, C.-L.C.-L.DaiPEI-ZEN CHANG2020-04-282020-04-281997https://scholars.lib.ntu.edu.tw/handle/123456789/486871In-situ micro strain gauges for measuring residual strain of three cmos thin films using only one maskless post-processing stepjournal article10.1080/02533839.1997.97418602-s2.0-0031220929https://www.scopus.com/inward/record.uri?eid=2-s2.0-0031220929&doi=10.1080%2f02533839.1997.9741860&partnerID=40&md5=a01d17324b28a5b61107e599781d55ec