Influence of homo-buffer layers and post-deposition rapid thermal annealing upon atomic layer deposition grown ZnO at 100 °C with three-pulsed precursors per growth cycle

Cheng, Y.-C.Y.-C.ChengYuan, K.-Y.K.-Y.YuanChen, M.-J.M.-J.ChenMIIN-JANG CHEN2020-05-122020-05-122017https://scholars.lib.ntu.edu.tw/handle/123456789/491725Influence of homo-buffer layers and post-deposition rapid thermal annealing upon atomic layer deposition grown ZnO at 100 °C with three-pulsed precursors per growth cyclejournal article10.1016/j.jcrysgro.2017.05.0332-s2.0-85020259198https://www.scopus.com/inward/record.uri?eid=2-s2.0-85020259198&doi=10.1016%2fj.jcrysgro.2017.05.033&partnerID=40&md5=e3f28a4b1cd290454290ac18b87804df