Lateral Non-uniformity Reduction by Compensatory Metal Embedded in MOS Structure with Ultra-Thin Anodic Oxide

J.Y.ChenW.C.KaoJ.G.Hwu*JENN-GWO HWU2019-10-312019-10-31201619386737https://scholars.lib.ntu.edu.tw/handle/123456789/429065Lateral Non-uniformity Reduction by Compensatory Metal Embedded in MOS Structure with Ultra-Thin Anodic Oxidejournal article10.1149/07202.0097ecst2-s2.0-85010705335