p-type semi-transparent conductive NiO films with high deposition rate produced by superimposed high power impulse magnetron sputtering

Chuang, T.-H.T.-H.ChuangWen, C.-K.C.-K.WenChen, S.-C.S.-C.ChenLiao, M.-H.M.-H.LiaoLiu, F.F.LiuSun, H.H.SunMING-HAN LIAOTUNG-HAN CHUANG2021-02-042021-02-042020https://www.scopus.com/inward/record.url?eid=2-s2.0-85089475103&partnerID=40&md5=ba7b9d18c587279b420ae3412b424533https://scholars.lib.ntu.edu.tw/handle/123456789/547499[SDGs]SDG7p-type semi-transparent conductive NiO films with high deposition rate produced by superimposed high power impulse magnetron sputteringjournal article10.1016/j.ceramint.2020.07.2672-s2.0-85089475103WOS:000577586400140