Investigation of carbon interstitials with varied SiO2 thickness in HfO2/SiO2/4H-SiC structure

JENN-GWO HWU2018-09-102018-09-102012http://www.scopus.com/inward/record.url?eid=2-s2.0-84871792674&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/370337Investigation of carbon interstitials with varied SiO2 thickness in HfO2/SiO2/4H-SiC structurejournal article10.1063/1.4772986