20 nm silicon nanorods fabricated by reactive ion etch

Dept. of Electr. Eng., National Taiwan Univ.Liang, Eih-ZheEih-ZheLiangHuang, Chao-JeiChao-JeiHuangLin, Ching-FuhChing-FuhLin2007-04-192018-07-062007-04-192018-07-062004-08http://ntur.lib.ntu.edu.tw//handle/246246/200704191001678application/pdf243864 bytesapplication/pdfen-US20 nm silicon nanorods fabricated by reactive ion etchjournal article10.1109/NANO.2004.1392393http://ntur.lib.ntu.edu.tw/bitstream/246246/200704191001678/1/01392393.pdf