Ruthenium oxide metal nanocrystal capacitors with high-kappa dielectric tunneling barriers for nanoscale nonvolatile memory device applications

Das, AtanuAtanuDasMaikap, S.S.MaikapLin, C.-H.C.-H.LinTzeng, P.-J.P.-J.TzengTien, T.-C.T.-C.TienWang, T.-Y.T.-Y.WangChang, L.-B.L.-B.ChangYang, J.-R.J.-R.YangJER-REN YANG2012-10-242018-06-282012-10-242018-06-282010http://ntur.lib.ntu.edu.tw//handle/246246/243845en-USRuthenium oxide metal nanocrystal capacitors with high-kappa dielectric tunneling barriers for nanoscale nonvolatile memory device applicationsjournal article10.1016/j.mee.2009.10.028http://ntur.lib.ntu.edu.tw/bitstream/246246/243845/-1/289.pdf