Nanolithography made from dual function water base magnetic LSMO resist

Chuang, C-M , Wu, M-C , Huang, Y-C , Chen, Y-FC-M , Wu, M-C , Huang, Y-C , Chen, Y-FChuangSu, W-FW-FSu2009-02-252018-06-282009-02-252018-06-282005http://ntur.lib.ntu.edu.tw//handle/246246/141091en-USNanolithography made from dual function water base magnetic LSMO resistjournal article