Characterization and properties of NiO films produced by rf magnetron sputtering with oxygen ion source assistance

Chen S.C.Wen C.K.Kuo T.Y.Peng W.C.HSIN-CHIH LIN2019-11-272019-11-27201400406090https://www.scopus.com/inward/record.uri?eid=2-s2.0-84920867579&doi=10.1016%2fj.tsf.2014.07.062&partnerID=40&md5=9124aac3d7e44230d043898324608e04https://scholars.lib.ntu.edu.tw/handle/123456789/432427Characterization and properties of NiO films produced by rf magnetron sputtering with oxygen ion source assistanceconference paper10.1016/j.tsf.2014.07.0622-s2.0-84920867579