Model-based proximity effect correction for electron-beam direct-write lithography

Chun-Hung LiuPei-Lin TienPhilip C. W. NgYu-Tian ShenKuen-Yu TsaiKUEN-YU TSAI2018-09-102018-09-102010-02http://scholars.lib.ntu.edu.tw/handle/123456789/359312Model-based proximity effect correction for electron-beam direct-write lithographyconference paper10.1117/12.8467062-s2.0-77953296611