Phase masks working in 157 nm wavelength fabricated by immersion interference photolithography

W. C. ChengL. A. WangLON A. WANG2018-09-102018-09-102003-11http://scholars.lib.ntu.edu.tw/handle/123456789/304317Phase masks working in 157 nm wavelength fabricated by immersion interference photolithographyjournal article10.1116/1.16259582-s2.0-0942278301WOS:000188193600152