Kwo, JJKwoMINGHWEI HONGBusch, BBBuschMuller, DADAMullerChabal, YJYJChabalKortan, ARARKortanMannaerts, JPJPMannaertsYang, BBYangYe, PPYeGossmann, HHGossmannothers2018-09-102018-09-102002http://scholars.lib.ntu.edu.tw/handle/123456789/297848Advances in high & kappa gate dielectrics for Si and III-V semiconductorsconference paper