Chemical mechanical polishing of low-dielectric-constant polymers: hydrogen silsesquioxane and methyl silsesquioxane

WEN-CHANG CHENLin, Shu-ChunShu-ChunLinDai, Bau-TongBau-TongDaiTsai, Ming-ShihMing-ShihTsai2018-09-102018-09-101999http://www.scopus.com/inward/record.url?eid=2-s2.0-0032592416&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/348055Chemical mechanical polishing of low-dielectric-constant polymers: hydrogen silsesquioxane and methyl silsesquioxanejournal article10.1149/1.13920432-s2.0-0032592416WOS:000082125300037