Sub-100 nm ALD-assisted nanoimprint lithography for realizing vertical organic transistors with high ON/OFF ratio and high output current

Hsu, Y.Y.HsuFang, X.X.FangWang, L.A.L.A.WangZan, H.-W.H.-W.ZanMeng, H.-F.H.-F.MengYang, S.-H.S.-H.YangLON A. WANG2020-06-042020-06-042014https://scholars.lib.ntu.edu.tw/handle/123456789/497235Sub-100 nm ALD-assisted nanoimprint lithography for realizing vertical organic transistors with high ON/OFF ratio and high output currentjournal article10.1016/j.orgel.2014.10.0082-s2.0-84949115735https://www.scopus.com/inward/record.uri?eid=2-s2.0-84949115735&doi=10.1016%2fj.orgel.2014.10.008&partnerID=40&md5=ed2e2fdc3c755ae8149228c8ad5813a5