High-quality nanothick single-crystal Y2 O3 films epitaxially grown on Si (111): Growth and structural characteristics

Lee, Y.J.Y.J.LeeLee, W.C.W.C.LeeNieh, C.W.C.W.NiehYang, Z.K.Z.K.YangKortan, A.R.A.R.KortanMINGHWEI HONGKwo, J.J.KwoHsu, C.-H.C.-H.Hsu2019-12-272019-12-272008https://scholars.lib.ntu.edu.tw/handle/123456789/443421[SDGs]SDG7High-quality nanothick single-crystal Y2 O3 films epitaxially grown on Si (111): Growth and structural characteristicsjournal article10.1116/1.28893872-s2.0-44649143095https://www.scopus.com/inward/record.uri?eid=2-s2.0-44649143095&doi=10.1116%2f1.2889387&partnerID=40&md5=e25c477abdc62396df1f4ab0093dd4b0