Huang, J.-J.J.-J.HuangTsai, Y.-J.Y.-J.TsaiTsai, M.-C.M.-C.TsaiHuang, L.-T.L.-T.HuangLee, M.-H.M.-H.LeeChen, M.-J.M.-J.ChenMIIN-JANG CHEN2020-05-122020-05-122015https://scholars.lib.ntu.edu.tw/handle/123456789/491750Impact of nitrogen depth profiles on the electrical properties of crystalline high-K gate dielectricsjournal article10.1016/j.apsusc.2014.11.0092-s2.0-84920690454https://www.scopus.com/inward/record.uri?eid=2-s2.0-84920690454&doi=10.1016%2fj.apsusc.2014.11.009&partnerID=40&md5=b720bb193d5646c2062a9a7f5d539c63