Effect of postoxidation annealing on the reliability of rapid thermal thin gate oxides

JENN-GWO HWU2018-09-102018-09-101997http://www.scopus.com/inward/record.url?eid=2-s2.0-0030784336&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/329951Effect of postoxidation annealing on the reliability of rapid thermal thin gate oxidesjournal article10.1109/55.553057