Investigation of nonuniformity phenomenon in nanoscale SiO 2 and high-k gate dielectrics

JENN-GWO HWU2018-09-102018-09-102012http://www.scopus.com/inward/record.url?eid=2-s2.0-84867071681&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/370336Investigation of nonuniformity phenomenon in nanoscale SiO 2 and high-k gate dielectricsjournal article10.1063/1.4754571