Low alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applications

Chen, H. L.H. L.ChenChuang, Y. F.Y. F.ChuangLee, C. C.C. C.LeeHsieh, C. I.C. I.HsiehKo, F. H.F. H.KoWang, L. A.L. A.Wang2009-03-252018-07-062009-03-252018-07-062003http://ntur.lib.ntu.edu.tw//handle/246246/148201application/pdf408485 bytesapplication/pdfen-USLow alkaline contamination bottom antireflective coatings for both 193- and 157-nm lithography applicationsjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/148201/1/48.pdf