李慧梅2006-07-262018-06-282006-07-262018-06-282004-07-31http://ntur.lib.ntu.edu.tw//handle/246246/22131本研究探討空氣負離子(NAI)與揮發性 有機污染物(VOCs)之反應，並選擇半導體產 業相關之三種揮發性有機污染物作為研究 之對象(chloroform, toluene 與 1,5-hexadiene) 。實驗之NAI 利用負極高壓放電產生， 放電電壓為15.0 kV。反應器中的放電裝 置，以dark discharge 設計用以防止O3 與 NOx 副產物之產生。在相對溼度為0 到 70% 之間， NAI 濃度為 1.34×106 到 1.24×106 ion cm-3 。實驗結果顯示NAI 與 chloroform, toluene 的反應級數為零級反 應。NAI 與1,5-hexadiene 的反應級數為 0.433。chloroform, toluene 與1,5-hexadiene 在相對溼度0 到 70%之間的反應速率常數 分別為1.74 − 3.07 ppb min-1, 1.07 − 2.66 ppb min-1, 以及 0.463 − 0.478 ppb0.567 min-1 。相 對溼度對於chloroform, toluene 與NAI 的 反應，有顯著的影響。但對於NAI 與 1,5-hexadiene 的反應則沒有顯著的影響。此 外NAI 與1,5-hexadiene 之反應，會生成一 個相對穩定的中間產物4-pentenal。整體而 言NAI 與VOCs 的反應屬於緩慢的反應。 在半導體無塵室中的應用，適合濃度等級在 ppb 以下之有機污染物，並需考量相關副產 物之生成。Although negative air ionizers have been used in air cleaning, little study have been done on removal of volatile organiccompounds (VOCs) by negative air ions (NAI). This study investigated the reactions of NAI and VOCs in a batch reactor. Three species of VOCs - chloroform, toluene and 1,5-hexadiene - were selected to react with NAI at relative humidity of 0, 25 and 70%. The NAI was generated by a negative electric discharge at 15.0 kV. The reaction chamber was designed as a dark discharge to prevent the generation of O3 and NOx. The NAI concentrations were 1.34×106 to 1.24×106 ion cm-3 at relative humidities between 0 and 70%. The results indicate that the order of the reactions of chloroform and toluene with NAI was zero, and 0.433 order for 1,5-hexadiene. The reaction rate constants of chloroform, toluene and 1,5-hexadiene were 1.74 − 3.07 ppb min-1, 1.07 − 2.66 ppb min-1 and 0.463 − 0.478 ppb0.567 min-1 at relative humidity from 0 to 70%. The effect of relative humidity on the reaction kinetics was obvious for chloroform and toluene but not for 1,5-hexadiene. The reaction between 1,5-hexa- diene and NAI generated a relatively stable intermediate species, 4-pentenal. The oxidation of chloroform, toluene and 1,5-hexadiene by NAI proceeded slowly.application/pdf212302 bytesapplication/pdfzh-TW國立臺灣大學環境工程學研究所空氣負離子揮發性有機污染物半導體產業負極放電Negative air ionSemiconductor industryVOCsreporthttp://ntur.lib.ntu.edu.tw/bitstream/246246/22131/1/922211E002024.pdf