Preparation of low-temperature fluorinated oxides by anodic oxidation in dilute hydrofluosilicic acid (H2SiF6) solution

JENN-GWO HWU2018-09-102018-09-101997http://www.scopus.com/inward/record.url?eid=2-s2.0-0031496818&partnerID=MN8TOARShttp://scholars.lib.ntu.edu.tw/handle/123456789/329948Preparation of low-temperature fluorinated oxides by anodic oxidation in dilute hydrofluosilicic acid (H2SiF6) solutionjournal article10.1116/1.580493