Single-run single-mask inductively-coupled-plasma reactive-ion-etching process for fabricating suspended high-aspect-ratio microstructures

Yang, Y. J.Y. J.YangKuo, W. C.W. C.KuoFan, K. C.K. C.Fan2010-09-072018-06-282010-09-072018-06-282005http://ntur.lib.ntu.edu.tw//handle/246246/200312en-USSingle-run single-mask inductively-coupled-plasma reactive-ion-etching process for fabricating suspended high-aspect-ratio microstructuresjournal article