Characteristics of plasma enhanced chemical vapor deposition-grown SiNx films prepared for deep ultraviolet attenuated phase-shifting masks

Chen, H. L.H. L.ChenWang, L.A.L.A.WangHsu, C.W.C.W.Hsu2008-12-312018-06-282008-12-312018-06-281998http://ntur.lib.ntu.edu.tw//handle/246246/95603application/pdf688147 bytesapplication/pdfen-USCharacteristics of plasma enhanced chemical vapor deposition-grown SiNx films prepared for deep ultraviolet attenuated phase-shifting masksjournal articlehttp://ntur.lib.ntu.edu.tw/bitstream/246246/95603/1/03.pdf