Tsai, Cheng YenCheng YenTsaiHSING-CHENG HSIKuo, Tien HoTien HoKuoChang, Yu MinYu MinChangLiou, Jian HongJian HongLiou2019-09-262019-09-262013-03-0416808584https://scholars.lib.ntu.edu.tw/handle/123456789/425144A high-quality, Cu-doped TiO 2 photocatalyst was prepared via a single-step process using an atmospheric-pressure plasma torch system. Degussa P-25 was thermally doped with Cu at Cu/(Cu + TiO 2 ) ratios of 0-5 wt.%. The raw and resulting nanoparticles were characterized using TEM, XRD, UV-Vis, and XPS. TEM showed that the particle size of plasma-treated TiO 2 was generally < 50 nm. 67-75% of the resulting particles, by number were between 10 and 20 nm. The remaining particles were < 10 nm (~10%) and between 20 and 30 nm (~10%). The XRD results showed that Cu doping decreased the anatase/rutile crystalline ratio compared to untreated P-25. Nevertheless, the greater the amount of Cu added, the greater the anatase/rutile ratio was for the Cu-doped TiO 2 . The UV-Vis results showed that the absorption wavelength for plasma-treated TiO 2 extended to the visible light range, especially for TiO 2 doped with 5 wt.% Cu. The XPS results revealed that the form of Ti was Ti 3+ and Ti 4+ , O was O 2- , and Cu was Cu + and Cu 2+ . The Hg 0 breakthrough tests indicated that the Cu-doped TiO 2 underwent appreciable Hg 0 removal under visible-light irradiation. Doped Cu effectively suppressed Hg reemission from the TiO 2 surface. Copyright © Taiwan Association for Aerosol Research.Hg | Metal doping | Plasma torch | Visible-light photocatalystjournal article10.4209/aaqr.2012.07.01962-s2.0-84874365804WOS:000315327400020https://api.elsevier.com/content/abstract/scopus_id/84874365804