Influences of Channel Deposition Conditions and Gate Insulators on Performances and Stability of Top-Gate IGZO Transparent Thin-Film Transistors

Hsing-Hung HsiehCheng-Han WuChih-Wei ChienChang-Ken ChenChao-Shun YangCHUNG-CHIH WU2018-09-102018-09-102010-10http://scholars.lib.ntu.edu.tw/handle/123456789/359346Influences of Channel Deposition Conditions and Gate Insulators on Performances and Stability of Top-Gate IGZO Transparent Thin-Film Transistorsjournal article10.1889/JSID18.10.7962-s2.0-77958195570WOS:000283668800012