Alkaline-developable and negative-type photosensitive polyimide with high sensitivity and excellent mechanical properties using photo-base generator

Tseng, Ling-YaLing-YaTsengLin, Yan-ChengYan-ChengLinKuo, Chih-ChengChih-ChengKuoChen, Chun-KaiChun-KaiChenWang, Chuan-EnChuan-EnWangKuo, Chi-ChingChi-ChingKuoUeda, MitsuruMitsuruUedaWEN-CHANG CHEN2021-02-042021-02-042020https://scholars.lib.ntu.edu.tw/handle/123456789/546529Alkaline-developable and negative-type photosensitive polyimide with high sensitivity and excellent mechanical properties using photo-base generatorjournal article10.1002/pol.20200409WOS:000562540000001