Characterization of Interstitial Oxygen in 200 μm Thick Silicon Wafer by Micro-FTIR System

K.-T. WuY.-H. ChangY.-M. Chang2020-06-112020-06-112017http://www.ntu-ccms.ntu.edu.tw/lab/ultrafast/index.htmhttps://scholars.lib.ntu.edu.tw/handle/123456789/501578Taipei, Taiwan,?Jan. 16-18, 2017Characterization of Interstitial Oxygen in 200 μm Thick Silicon Wafer by Micro-FTIR Systemposter