廖運炫臺灣大學:機械工程學研究所江瑞軒Chiang, Jui-HsuanJui-HsuanChiang2010-06-302018-06-282010-06-302018-06-282008U0001-3007200810490300http://ntur.lib.ntu.edu.tw//handle/246246/187064近年來半導體晶片不斷地朝向小體積、高電路密集度、快速、低耗電方向發展，化學機械拋光(Chemical Mechanical Polishing, CMP)為目前最廣泛地應用在全面性平坦化的製程。在化學機械拋光製程中，拋光墊(pad)上的溝紋會隨使用時間而消逝，逐漸失去拋光功能。為了維持拋光速率及效率，必須使用鑽石修整器(diamond conditioner)適時地修整拋光墊，清除堆積在拋光墊表面微細孔洞內的雜質並重新產生溝紋。目前業界廣泛使用的鑽石修整器採用硬焊的方式將鑽石顆粒排成陣列形式。文欲提出一合乎大量生產的ADDSemiconductor chip develops toward smaller volume, high density circuit, and low power consumption in recently years. CMP is broadly applied to planarization process in large surface. During CMP process, polishing pad lose it function with time, therefore, diamond conditioner need to be dressed in order to scrape glazed pad and regenerate new asperities on pad. Diamond conditioner is composed of artificial diamond brazed on substrate and arranged in matrices. his article shows a new mass production manufacturing process for diamond conditioner. Using experiment to realize whether die-sinking electric discharge machining can make pyramid structure on PCD surface or not. This article is composed of three parts: (1) Designing and manufacturing electrode. According to property of copper electrode which is suit for smaller current in EDM made by WEDM. (2) Searching for electric discharge parameters. According to voltage and current waveform observed by oscilloscope, not only try to find parameters which waveform is almost normal but also get lower electrode consumption and less machining. (3) Machining procedures of micro pyramid on PCD are divided into six parts and made it by EDM. Micro pyramid on PCD are successfully made by this manufacturing process which is shown in this article, the smallest difference of tip height is about 7μm in a row, others are less than 20μm.中文摘要 Ibstract II錄 III目錄 V目錄 VI號對照表 IX一章 緒論 1.1引言 1.2文獻回顧 2.3研究目的 11.4本文結構 12二章 放電加工原理 14.1 放電加工原理 14.1.1放電轉換過程 17.1.2放電火花結構 18.2雕模放電加工機系統 20.3 放電加工波形及參數 24.4放電波形的種類 27三章 實驗設備與方法 29.1實驗設備 29.2實驗方法 33四章 鑽石修整器之製程 34.1 電極設計與製作 36.1.1實驗規劃 36.1.2電極外形設計 36.1.3電極材料 39.1.4製作電極 39.2 雕模放電加工PCD參數的選定 41.2.1實驗規劃 41.2.2 放電參數的決定方式 41.3 製作鑽石修整器 45.3.1實驗規劃 48.3.2 Z軸方向加工 48.3.3 X軸方向加工 50.3.4 更新電極重複前兩小節步驟 51.3.5 工件旋轉90度Z軸方向加工 52.3.6 X軸方向加工 53.3.7 Y軸平移補償 54.4實驗結果與討論 56五章 結論與未來展望 58.1結論 58.2未來展望 59考文獻 603547705 bytesapplication/pdfen-US雕模放電加工化學機械拋光鑽石修整器PCD(polycrystalline diamond)electric discharge machiningchemical mechanical polishingdiamond conditionerdiamond dresserpolycrystalline diamondthesishttp://ntur.lib.ntu.edu.tw/bitstream/246246/187064/1/ntu-97-R94522715-1.pdf