Novel Self-shrinking Mask for Sub-3 nm Pattern Fabrication

Yang P.-S.Cheng P.-H.Kao C.R.C. ROBERT KAOMIIN-JANG CHEN2019-11-272019-11-27201620452322https://www.scopus.com/inward/record.uri?eid=2-s2.0-84978897498&doi=10.1038%2fsrep29625&partnerID=40&md5=d6f26c34f1f6e791a6e0dcc8bf2f5a83https://scholars.lib.ntu.edu.tw/handle/123456789/432595[SDGs]SDG7Novel Self-shrinking Mask for Sub-3 nm Pattern Fabricationjournal article10.1038/srep296252-s2.0-84978897498